Epitaxial semiconductor layer and method

ABSTRACT

A method for epitaxially forming a first semiconductor structure attached to a second semiconductor structure is provided. Devices and methods described include advantages such as reduced lattice mismatch at an epitaxial interface between two different semiconductor materials. One advantageous application of such an interface includes an electrical-optical communication structure. Methods such as deposition of layers at an elevated temperature provide easy formation of semiconductor structures with a modified lattice constant that permits an improved epitaxial interface.

TECHNICAL FIELD

This invention relates to semiconductor devices and semiconductor devicefabrication. Specifically this invention relates to epitaxialsemiconductor layers and methods or their formation.

BACKGROUND

As the minimum feature size achievable in semiconductor manufacturingdecreases, the number of devices that can be formed in a given areaincreases with the inverse square of this feature size. As the arealdensity of devices is raised, both the device size and inter-devicedistances must shrink accordingly. At the same time the maximum size ofa chip which can be economically produced has continuously increased.This has lead to an unprecedented increase in the complexity of chipsand a need for the rapid movement of large amounts of data both withinand between adjacent chips and from the chips to the world beyond. Thishas lead to numerous levels of interconnect on a chip as well as therequirement for higher and higher input/output connections.

One design improvement to address problems listed above includes the useof optical communication instead of electrical communications betweendevices on a chip and between chips. Semiconductors other than siliconare desirable to form highly effective optical communication structures.Semiconductor materials such as gallium arsenide (GaAs) can easilyconvert electrical signals to optical and optical to electrical. Itwould therefore be desirable to connect a portion of siliconsemiconductor to a GaAs interface. A useful technique to couple asemiconductor such as GaAs to silicon includes epitaxially growing GaAsareas on silicon chips. One problem with this approach is that thelattice constant of GaAs does not match the lattice constant of silicon,thus causing strain or defects at the silicon/GaAs interface. Althoughsilicon and GaAs are used as an example, interfaces between othersemiconductor materials pose similar lattice mismatch problems.

What is needed is an improved method to form an epitaxial layer ofsemiconductor of one type over a semiconductor of another type to reducelattice mismatch. In one specific embodiment, what is needed is a methodto form a GaAs layer on a silicon surface with improved interfacialcharacteristics.

SUMMARY

A method of forming an interface between two semiconductor structures isshown. The method includes selecting a first semiconductor materialhaving a first lattice constant different from a second semiconductormaterial having a second lattice constant. The method also includesselecting at least one impurity element with an atomic radius that isdifferent from an average atomic radius of the first semiconductormaterial. The method also includes selecting an amount of the impurityelement wherein the amount and atomic radius of the impurity elementmodifies the first lattice constant to reduce mismatch with the secondlattice constant. A first structure is formed that is attachedepitaxially to a second structure. The second semiconductor structure isformed from the second semiconductor material. Forming the firstsemiconductor structure includes forming using the selected firstsemiconductor material and the amount of the impurity element.

Devices formed by methods described below include interfaces,electrical-optical interface devices, microprocessors, memory devicesand information handling systems. One example of a device includes afirst semiconductor base structure, and an epitaxial layer of a secondsemiconductor over at least a portion of the first semiconductor basestructure. The device also includes an amount of an impurity elementwithin the epitaxial layer of the second semiconductor wherein theamount of an impurity element modifies a lattice constant of theepitaxial layer to reduce lattice mismatch with the first semiconductorbase structure. In one embodiment, the impurity elements are selected sothat the lattice mismatch is reduced or eliminated and that the chargebalance within the epitaxial layer is unchanged.

These and other embodiments, aspects, advantages, and features of thepresent invention will be set forth in part in the description whichfollows, and in part will become apparent to those skilled in the art byreference to the following description of the invention and referenceddrawings or by practice of the invention. The aspects, advantages, andfeatures of the invention are realized and attained by means of theinstrumentalities, procedures, and combinations particularly pointed outin the appended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A shows a model of an undistorted semiconductor material accordingto an embodiment of the invention.

FIG. 1B shows a model of an undistorted two element semiconductormaterial according to an embodiment of the invention.

FIG. 2A shows an interface between structures according to an embodimentof the invention.

FIG. 2B shows a block diagram of a stage in processing an interfaceaccording to an embodiment of the invention.

FIG. 3 shows a block diagram of an integrated circuit according to anembodiment of the invention.

FIG. 4 shows a flow diagram according to an embodiment of the invention.

FIG. 5 shows an information handling system according to an embodimentof the invention.

FIG. 6 shows a block diagram of a processing unit according to anembodiment of the invention.

FIG. 7 shows a block diagram of a memory device according to anembodiment of the invention.

DETAILED DESCRIPTION

In the following detailed description of the invention, reference ismade to the accompanying drawings which form a part hereof, and in whichis shown, by way of illustration, specific embodiments in which theinvention may be practiced. In the drawings, like numerals describesubstantially similar components throughout the several views. Theseembodiments are described in sufficient detail to enable those skilledin the art to practice the invention. Other embodiments may be utilizedand structural, logical, and electrical changes may be made withoutdeparting from the scope of the present invention. The terms wafer andsubstrate used in the following description include any structure havingan exposed surface with which to form a device or integrated circuit(IC) structure. The term substrate is understood to includesemiconductor wafers. The term substrate is also used to refer tosemiconductor structures during processing, and may include otherlayers, such as silicon-on-insulator (SOI), etc. that have beenfabricated thereupon. Both wafer and substrate include doped and undopedsemiconductors, epitaxial semiconductor layers supported by a basesemiconductor or insulator, as well as other semiconduictor structureswell known to one skilled in the art. The term conductor is understoodto include semiconductors, and the term insulator or dielectric isdefined to include any material that is less electrically conductivethan the materials referred to as conductors.

The term “horizontal” as used in this application is defined as a planeparallel to the conventional plane or surface of a wafer or substrate,regardless of the orientation of the wafer or substrate. The term“vertical” refers to a direction perpendicular to the horizontal asdefined above. Prepositions, such as “on”, “side” (as in “sidewall”),“higher”, “lower”, “over” and “under” are defined with respect to theconventional plane or surface being on the top surface of the wafer orsubstrate, regardless of the orientation of the wafer or substrate. Thefollowing detailed description is, therefore, not to be taken in alimiting sense, and the scope of the present invention is defined onlyby the appended claims, along with the full scope of equivalents towhich such claims are entitled. The term host matrix refers to amaterial as used in a composite structure such as a semiconductor matrixwith dopant impurities. The term host lattice refers to a structure orregular pattern of atoms within the host matrix.

FIG. 1A shows one embodiment of a single element semiconductor lattice100. The lattice 100 is made up of a number of host atoms 102 that areheld together by bonds 104. Although a two dimensional lattice is shownfor illustration, one of ordinary skill in the art will recognize thatthe concepts described below apply to three dimensional lattices. Thelattice 100 of FIG. 1A includes a lattice constant 106. Examples ofsingle element semiconductors include, but are not limited to silicon(Si) and germanium (Ge).

FIG. 1B shows one embodiment of a multiple element semiconductor lattice110. The lattice 110 includes a first element 112 with a first atomicradius 113 and a second element 114 with a second atomic radius 115. Thelattice 110 includes an average atomic radius of:

$r_{av} = \frac{\left( {r_{1} + r_{2}} \right)}{2}$

The elements of the lattice 110 are held together by bonds 116. Similarto the single element lattice described in FIG. 1A, although a twodimensional lattice is shown for illustration, one of ordinary skill inthe art will recognize that the concepts described below apply to threedimensional lattices. The lattice 110 of FIG. 1B includes a latticeconstant 118. Examples of multiple element semiconductors includegallium arsenide (GaAs) and indium phosphide (InP) for example.

Although dimensions of FIGS. 1A and 1B are not to scale, the latticeconstant 106 is shown as slightly smaller than the lattice constant 118.It is common for different semiconductors to have different latticeconstants. In an epitaxial growth application, atoms of a semiconductorattempt to line up with atoms on the surface where the structure orlayer is being grown. If there is a lattice mismatch, the structure orlayer being grown will be strained, and may not adhere to the surfacewhere the structure is being grown.

FIG. 2A shows a first semiconductor structure 200 with a secondsemiconductor structure 210 attached epitaxially to the firstsemiconductor structure 200. An interface 230 is shown between the firstsemiconductor structure 200 and the second semiconductor structure 210.In one embodiment, the first semiconductor structure includes a singleelement semiconductor. In one embodiment, the first semiconductorstructure includes crystalline silicon. Although silicon is used as anexample, other semiconductors including, but not limited to germanium,gallium arsenide, indium phosphide, etc. can be used as the firstsemiconductor structure 200. Similar to the single element semiconductorshown in FIG. 1A, the first semiconductor structure 200 includes anumber of atoms 202 that are attached to each other with bonds 204. Thefirst semiconductor structure 200 includes a lattice constant 206 asshown.

In one embodiment, the second semiconductor structure 210 includes asemiconductor material that is different from the material of the firstsemiconductor structure 200. In one embodiment, the second semiconductorstructure 210 includes gallium arsenide. Similar to the multiple elementsemiconductor shown in FIG. 1B, the second semiconductor structure 210includes a number of first atoms 212, and a number of second atoms 214that are attached to each other with bonds 216. Gallium arsenideexhibits a lattice spacing that is approximately 5.5% larger thansilicon. In its intrinsic form, gallium arsenide does not grow well onsilicon, and tends to separate due to the lattice mismatch.

In one embodiment, an impurity element 220 is chosen for addition to thematrix of the second semiconductor structure 210. In one embodiment, theimpurity element 220 has an atomic radius 222 that is different from anaverage atomic radius of the host matrix. In one embodiment where thesecond semiconductor structure 210 host matrix is gallium arsenide, theimpurity element 220 includes carbon. Examples of different atomic radiiinclude silicon (1.173 Å); gallium (1.245 Å); arsenic (1.21 Å); andcarbon (0.77 Å). The atomic radii numbers shown are primarily forrelative comparison between elements. This is because atoms can beassigned more than one radii depending on the character of the solidthat they are present in i.e. metallic, single bond covalent, etc.

An amount of the impurity element 220 is selected to modify the latticeconstant 218 of the second semiconductor structure 210. In oneembodiment, the goal of modifying the lattice constant 218 of the secondsemiconductor structure 210 is to reduce an amount of lattice mismatchwith respect to the first semiconductor structure 200. FIG. 2A shows thelattice constant 218 being modified to approximately the same dimensionas the lattice constant 206 of the first semiconductor structure 200. Byreducing the lattice mismatch, it becomes practical to attach a secondsemiconductor structure 210 to a first semiconductor structure 200 asshown in FIG. 1A. Other embodiments include modifying the latticeconstant 218 of the second semiconductor structure 210 in a controlledmanner to adjust it to a non-intrinsic value of lattice constant.

One advantage of an element such as carbon for an impurity element 220includes a low or nonexistent electrical effect of the impurity element220 on the host matrix. In one embodiment, other impurity elements suchas boron, phosphorus, etc. are used as impurity elements. In oneembodiment an electrical effect of impurity elements on the host matrixis controlled by selecting amounts of impurity elements to offset eachother electrically. Single impurity elements are used in selectedembodiments within a host matrix, however multiple impurity elements areused in other embodiments. In one embodiment, elements with a valance of4 are chosen. One advantage of elements with a valence of 4 includes theability to substitute within a silicon lattice without changing thecharge of the host matrix. In another embodiment, elements of othervalences are substituted for a host element of the same valance.

FIG. 2B shows a step from one method of forming a second semiconductorstructure 210 as described above. The first semiconductor structure 200is shown as a substrate, or other structure. In one embodiment, thefirst semiconductor structure 200 includes a silicon wafer. In oneembodiment, to form the second semiconductor structure 210, a number oflayers 240 are formed on a surface of the first semiconductor structure200. Individual layers 242 are shown in FIG. 2B as part of the number oflayers 240. For illustration, only a few layers 242 are shown, however,as described below, much larger numbers of layers are within the scopeof the invention. Although layer deposition is described, other methodsof introducing impurity elements such as implantation, etc. are withinthe scope of the invention.

In one embodiment, the layers 242 are formed using atomic layerdeposition to form monolayers. Other possible techniques includechemical vapor deposition, physical vapor deposition, sputtering,evaporation, etc. One advantage of atomic layer deposition includesshorter atomic diffusion/movement distances as will be discussed below.Using the gallium arsenide on silicon example described above, thelattice mismatch is approximately 5.5%. In one embodiment, approximately13.9 atomic percent carbon is added to the gallium arsenide to modifythe GaAs lattice constant to match silicon. In one embodiment, using anumber of layers 240, a deposition routine includes the followinglayers:

-   Ga/As/Ga/As/Ga/As/Ga/As/C/Ga/As/Ga/As/Ga/As/C/Ga/As/Ga/As/Ga/As/C.

This sequence can be repeated as many times as necessary until a desiredthickness for the second semiconductor structure 210 is achieved. In oneembodiment, the deposition process of the number of layers 240 isperformed at a temperature that is high enough for the individual layersto reorganize themselves into a modified second semiconductor structure210. In one embodiment an elevated temperature is applied duringdeposition, however the temperature can be applied after deposition. Asdiscussed above, one advantage of atomic layer deposition includes theshort distances that atoms in the layers 242 are required to move forreorganization. In one embodiment, the elevated temperature isapproximately 500 degrees Celsius, which is high enough to promotereorganization in the number of layers 240, yet not so high as tonegatively impact other structures in an integrated circuit, memorydevice, etc.

A number of possibilities exist for location of impurity atoms withinthe host matrix. The locations depend at least in part on the choice ofimpurity element and the choice of the host matrix. Within a givensystem, some locations are more energetically favorable than others dueto geometry of the host lattice, bonding characteristics of the elementsin the system, etc. In one embodiment, impurity atoms are incorporatedinto the host matrix as substitutional atoms as shown in FIG. 2A. In oneembodiment, impurity atoms reside as doublets with carbon atoms residingon adjacent Ga and As positions, in an eight atom GaAs lattice unitcell.

Although not limited to these examples, other layer depositioncombinations include indium phosphide on silicon with a depositionsequence of the following layers:In/P/In/P/C/In/P/InP/In/P/C/In/P/In/P/C/In/P/In/P/C. This sequence canbe repeated as many times as necessary until a desired thickness isachieved. Another combination includes GaAs on germanium with adeposition sequence of the following layers: Ga/As/Ga/As (15 totallayers of Ga and As) /C. This sequence can be repeated as many times asnecessary until a desired thickness is achieved. Another combinationincludes InP on germanium with a deposition sequence of the followinglayers:In/P/In/P/In/P/In/P/In/P/In/P/In/P/C/In/P/In/P/In/P/In/P/In/P/In/P/C.This sequence can be repeated as many times as necessary until a desiredthickness is achieved. Another combination includes GaAs on siliconusing a boron impurity element. An example a deposition layer sequenceincludes: Ga/As/Ga/As/B/As/Ga/As/Ga/As/B/As/Ga/As/Ga/As/B. This sequencecan be repeated as many times as necessary until a desired thickness isachieved. In this case Boron is substituted for a portion of the Galliumin the epitaxial layer.

FIG. 3 shows an integrated circuit 300 incorporating embodiments asdescribed above. A substrate 310 is shown with a number of electronicdevices 320 formed on or within the substrate 310. In one embodiment,the substrate 310 includes a silicon chip, and the number of electronicdevices 320 includes transistors. In one embodiment, a semiconductorstructure such as a mesa 330 is formed over at least a portion of thesubstrate 310. In one embodiment, the mesa 330 is formed using impurityelements as described in embodiments above. An optical waveguide 340 isshown coupled to at least a portion of the mesa structure 330.Additional chip structure 350 such as further layers, packaging, etc. isrepresented as a block in ghost lines.

As described above, the optical waveguide can be used to transmitsignals between devices, between circuit, between chips, etc. quicklyand without generating resistive heat as in electrically conductingelements. The mesa 330 provides a material that is suited to opticaltransmission, while the substrate is suited for formation of otherstructures and electronic devices 320.

FIG. 4 shows one method of forming interfaces using embodimentsdescribed above. One step include selecting a first semiconductormaterial with a lattice constant. Another step includes selecting asecond semiconductor material with a lattice constant that is differentfrom the first semiconductor material. Oxidize a surface of a firstsemiconductor structure. Another step includes masking a portion of theoxide on the first semiconductor structure and remove a selected area ofthe oxide. Another step includes selecting at least one impurity elementwith an atomic radius that is different from an average atomic radius ofthe first semiconductor material. Another step includes selecting anamount of the impurity element wherein the amount and atomic radius ofthe impurity element modifies the first lattice constant to reducemismatch with the second lattice constant. Another step includesdepositing layers of a second semiconductor along with layers of animpurity element within the selected area defined from the masking step.Another step includes applying heat to the layers to form an epitaxialstructure with a close match in lattice spacing. Although FIG. 4 showsone method, the invention is not so limited. Other orders of steps arepossible. Other methods are included with different steps, fewer steps,or additional steps.

Semiconductor structures, interface, semiconductor devices, and IC'screated by the methods described above may be implemented into memorydevices and information handling devices as shown in FIG. 5, FIG. 6, andFIG. 7 and as described below. While specific types of memory devicesand computing devices are shown below, it will be recognized by oneskilled in the art that several types of memory devices and informationhandling devices could utilize the invention.

A personal computer, as shown in FIGS. 5 and 6, includes a monitor 500,keyboard input 502 and a central processing unit 504. The processor unittypically includes microprocessor 606, memory bus circuit 608 having aplurality of memory slots 612(a–n), and other peripheral circuitry 610.Peripheral circuitry 610 permits various peripheral devices 624 tointerface processor-memory bus 620 over input/output (I/O) bus 622. Thepersonal computer shown in FIGS. 5 and 6 also includes at least onetransistor having a gate oxide according to the teachings of the presentinvention.

Microprocessor 606 produces control and address signals to control theexchange of data between memory bus circuit 608 and microprocessor 606and between memory bus circuit 608 and peripheral circuitry 610. Thisexchange of data is accomplished over high speed memory bus 620 and overhigh speed I/O bus 622.

Coupled to memory bus 620 are a plurality of memory slots 612(a–n) whichreceive memory devices well known to those skilled in the art. Forexample, single in-line memory modules (SIMMs) and dual in-line memorymodules (DIMMs) may be used in the implementation of the presentinvention.

These memory devices can be produced in a variety of designs whichprovide different methods of reading from and writing to the dynamicmemory cells of memory slots 612. One such method is the page modeoperation. An alternate type of device is the extended data output (EDO)memory. Other alternative types of devices include SDRAM, DDR SDRAM,SLDRAM and Direct RDRAM as well as others such as SRAM or Flashmemories.

FIG. 7 is a block diagram of an illustrative DRAM device 700 compatiblewith memory slots 612(a–n). The description of DRAM 700 has beensimplified for purposes of illustrating a DRAM memory device and is notintended to be a complete description of all the features of a DRAM.Those skilled in the art will recognize that a wide variety of memorydevices may be used in the implementation of the present invention. Theexample of a DRAM memory device shown in FIG. 7 includes at least onetransistor having a gate oxide according to the teachings of the presentinvention.

Control, address and data information provided over memory bus 620 isfurther represented by individual inputs to DRAM 700, as shown in FIG.7. These individual representations are illustrated by data lines 702,address lines 704 and various discrete lines directed to control logic706.

As is well known in the art, DRAM 700 includes memory array 710 which inturn comprises rows and columns of addressable memory cells. Each memorycell in a row is coupled to a common wordline. Additionally, each memorycell in a column is coupled to a common bitline. Each cell in memoryarray 710 includes a storage capacitor and an access transistor as isconventional in the art.

DRAM 700 interfaces with, for example, microprocessor 606 throughaddress lines 704 and data lines 702. Alternatively, DRAM 700 mayinterface with a DRAM controller, a micro-controller, a chip set orother electronic system. Microprocessor 606 also provides a number ofcontrol signals to DRAM 700, including but not limited to, row andcolumn address strobe signals RAS and CAS, write enable signal WE, anoutput enable signal OE and other conventional control signals.

Row address buffer 712 and row decoder 714 receive and decode rowaddresses from row address signals provided on address lines 704 bymicroprocessor 606. Each unique row address corresponds to a row ofcells in memory array 710. Row decoder 714 includes a wordline driver,an address decoder tree, and circuitry which translates a given rowaddress received from row address buffers 712 and selectively activatesthe appropriate wordline of memory array 710 via the wordline drivers.

Column address buffer 716 and column decoder 718 receive and decodecolumn address signals provided on address lines 704. Column decoder 718also determines when a column is defective and the address of areplacement column. Column decoder 718 is coupled to sense amplifiers720. Sense amplifiers 720 are coupled to complementary pairs of bitlinesof memory array 710.

Sense amplifiers 720 are coupled to data-in buffer 722 and data-outbuffer 724. Data-in buffers 722 and data-out buffers 724 are coupled todata lines 702. During a write operation, data lines 702 provide data todata-in buffer 722. Sense amplifier 720 receives data from data-inbuffer 722 and stores the data in memory array 710 as a charge on acapacitor of a cell at an address specified on address lines 704.

During a read operation, DRAM 700 transfers data to microprocessor 606from memory array 710. Complementary bitlines for the accessed cell areequilibrated during a precharge operation to a reference voltageprovided by an equilibration circuit and a reference voltage supply. Thecharge stored in the accessed cell is then shared with the associatedbitlines. A sense amplifier of sense amplifiers 720 detects andamplifies a difference in voltage between the complementary bitlines.The sense amplifier passes the amplified voltage to data-out buffer 724.

Control logic 706 is used to control the many available functions ofDRAM 700. In addition, various control circuits and signals not detailedherein initiate and synchronize DRAM 700 operation as known to thoseskilled in the art. As stated above, the description of DRAM 700 hasbeen simplified for purposes of illustrating the present invention andis not intended to be a complete description of all the features of aDRAM.

Those skilled in the art will recognize that a wide variety of memorydevices, including but not limited to, SDRAMs, SLDRAMs, RDRAMs and otherDRAMs and SRAMs, VRAMs and EEPROMs, may be used in the implementation ofthe present invention. The DRAM implementation described herein isillustrative only and not intended to be exclusive or limiting.

Devices and methods described above include advantages such as reducedlattice mismatch at an epitaxial interface between two differentsemiconductor materials. One advantageous application of such aninterface includes an electrical-optical communication structure.Methods such as deposition of layers at an elevated temperature provideeasy formation of semiconductor structures with a modified latticeconstant that permits an improved epitaxial interface.

While a number of advantages of embodiments described herein are listedabove, the list is not exhaustive. Other advantages of embodimentsdescribed above will be apparent to one of ordinary skill in the art,having read the present disclosure. Although specific embodiments havebeen illustrated and described herein, it will be appreciated by thoseof ordinary skill in the art that any arrangement which is calculated toachieve the same purpose may be substituted for the specific embodimentshown. This application is intended to cover any adaptations orvariations of the present invention. It is to be understood that theabove description is intended to be illustrative, and not restrictive.Combinations of the above embodiments, and other embodiments will beapparent to those of skill in the art upon reviewing the abovedescription. The scope of the invention includes any other applicationsin which the above structures and fabrication methods are used. Thescope of the invention should be determined with reference to theappended claims, along with the full scope of equivalents to which suchclaims are entitled.

1. A method of forming an interface between two semiconductor structurescompnsing: selecting a first semiconductor material having a firstlattice constant different from a second semiconductor material having asecond lattice constant; selecting at least one impurity element with anatomic radius that is different from an average atomic radius of thefirst semiconductor material; selecting an amount of the impurityelement wherein the amount and atomic radius of the impurity elementmodifies the first lattice constant to reduce mismatch with the secondlattice constant; and forming a first structure attached epitaxially toa second structure wherein the second semiconductor structure is formedfrom the second semiconductor material; and wherein forming the firstsemiconductor structure includes forming using the selected firstsemiconductor material and the amount of the impurity element.
 2. Themethod of claim 1, wherein the first semiconductor material is chosenfrom a group consisting of GaAs and InP.
 3. The method of claim 1,wherein the second semiconductor material is chosen from a groupconsisting of silicon, germanium, and GaAs.
 4. The method of claim 1,wherein the at least one impurity element includes an element that iselectrically inactive in the first semiconductor material.
 5. The methodof claim 1, wherein the at least one impurity element includes carbon.6. The method of claim 1, wherein the at least one impurity elementincludes boron.
 7. A method of forming an interface between silicon andanother semiconductor material, comprising: selecting a firstsemiconductor material having a first lattice constant different fromsilicon; selecting at least one impurity element with an atomic radiusthat is different from an average atomic radius of the firstsemiconductor material; selecting an amount of the impurity elementwherein the amount and atomic radius of the impurity element modifiesthe first lattice constant to reduce mismatch with a silicon latticeconstant; and forming a first structure attached epitaxially to silicon,wherein forming the first semiconductor structure includes forming usingthe selected first semiconductor material and the amount of the impurityelement.
 8. The method of claim 7, wherein forming using the selectedfirst semiconductor material and the amount of the impurity elementincludes depositing a number of layers including at least one layer ofthe first semiconductor material and at least one layer of the impurityelement; and processing at a temperature where the number of layersreorganize themselves into a modified first semiconductor material witha modified lattice constant.
 9. The method of claim 8, whereindepositing a number of layers includes depositing atomically thicklayers.
 10. The method of claim 8, wherein at least one layer of thefirst semiconductor material includes layers of gallium and arsenic; andat least one layer of the impurity element includes a layer of carbon.11. The method of claim 10, wherein depositing a number of layersincludes depositing atomic layers in the following sequence:Ga/As/Ga/As/Ga/As/Ga/As/C/Ga/As/Ga/As/Ga/As/C/Ga/As/Ga/As/Ga/As/C; andwherein the sequence is repeated at least one time.
 12. The method ofclaim 8, wherein depositing a number of layers includes depositingatomic layers in the following sequence:In/P/In/P/C/In/P/In/P/In/P/C/In/P/In/P/C/In/P/In/P/C; and wherein thesequence is repeated at least one time.
 13. A method of forming aninterface between two semiconductor structures comprising: selecting afirst semiconductor material having a first lattice constant differentfrom a second semiconductor material having a second lattice constant;selecting a plurality of impurity elements with atomic radii that aredifferent from an average atomic radius of the first semiconductormaterial selecting amounts of each impurity element of the plurality ofimpurity elements wherein amounts and atomic radii of each of theplurality of impurity elements combine to modify the first latticeconstant and reduce mismatch with the second lattice constant; forming afirst structure attached epitaxially to a second structure wherein thesecond semiconductor structure is formed from the second semiconductormaterial; and wherein forming the first semiconductor structure includesforming using the selected first semiconductor material and the amountsof the plurality of impurity elements.
 14. The method of claim 13,wherein the first semiconductor material is chosen from a groupconsisting of GaAs and InP.
 15. The method of claim 13, wherein thesecond semiconductor material is chosen from a group consisting ofsilicon, germanium, and GaAs.
 16. A method of forming anelectrical-optical interface device in an integrated circuit,comprising: selecting a first semiconductor material having a firstlattice constant different from silicon; selecting at least one impurityelement with an atomic radius that is different from an average atomicradius of the first semiconductor material; selecting an amount of theimpurity element wherein the amount and atomic radius of the impurityelement modifies the first lattice constant to reduce mismatch with asilicon lattice constant; forming a mesa structure attached epitaxiallyto silicon, wherein forming the mesa structure includes forming usingthe selected first semiconductor material and the amount of the impurityelement; and coupling an optical waveguide to a portion of the mesastructure.
 17. The method of claim 16, wherein forming using theselected first semiconductor material and the amount of the impurityelement includes depositing a number of layers including at least onelayer of the first semiconductor material and at least one layer of theimpurity element; and processing at a temperature where the number oflayers reorganize themselves into a modified first semiconductormaterial with a modified lattice constant.
 18. The method of claim 17,wherein depositing a number of layers includes depositing atomic layersin the following sequence:Ga/As/Ga/As/Ga/As/Ga/As/C/Ga/As/Ga/As/Ga/As/C/Ga/As/Ga/As/Ga/As/C; andwherein the sequence is repeated at least one time.
 19. The method ofclaim 17, wherein depositing a number of layers includes depositingatomic layers in the following sequence:In/P/In/P/C/In/P/In/P/In/P/C/In/P/In/P/C/In/P/In/P/C; and wherein thesequence is repeated at least one time.
 20. The method of claim 17,wherein processing at a temperature includes processing at approximately500 degrees Celsius.
 21. A method of forming an electrical-opticalinterface device in an integrated circuit, comprising: selecting atleast one impurity element with an atomic radius that is different froman average atomic radius of gallium arsenide; selecting an amount of theimpurity element wherein the amount and atomic radius of the impurityelement modifies a lattice constant of gallium arsenide to reducemismatch with a silicon lattice constant; forming a gallium arsenidemesa structure attached epitaxially to silicon, wherein forming the mesastructure includes forming using the selected first semiconductormaterial and the amount of the impurity element; and coupling an opticalwaveguide to a portion of the mesa structure.
 22. The method of claim21, wherein the impurity element includes carbon.
 23. The method ofclaim 22, wherein selecting an amount of the impurity element includesapproximately 11.9 atomic percent carbon.